发明授权
- 专利标题： Method for producing a microstructured surface relief by embossing thixotropic layers
- 专利标题（中）： 通过压花触变层制造微结构化表面浮雕的方法
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申请号： US10169971申请日： 2001-01-12
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公开(公告)号： US06855371B2公开(公告)日： 2005-02-15
- 发明人: Andreas Gier , Nora Kunze , Martin Mennig , Peter W. Oliveira , Stefan Sepeur , Bruno Schaefer , Helmut Schmidt
- 申请人： Andreas Gier , Nora Kunze , Martin Mennig , Peter W. Oliveira , Stefan Sepeur , Bruno Schaefer , Helmut Schmidt
- 申请人地址： DE Saarbruecken
- 专利权人： Institut fuer Neue Materialien gemeinnuetzige GmbH
- 当前专利权人： Institut fuer Neue Materialien gemeinnuetzige GmbH
- 当前专利权人地址： DE Saarbruecken
- 代理机构： Greenblum & Bernstein, P.L.C.
- 优先权： DE10001135 20000113
- 国际申请： PCTEP01/00333 WO 20010112
- 国际公布： WO0151220 WO 20010719
- 主分类号： B05D5/06
- IPC分类号： B05D5/06 ; B05D1/42 ; B05D3/12 ; B05D7/24
摘要：
A method is described for producing a microstructured surface relief by applying to a substrate a coating composition which is thixotropic or which acquires thixotropic properties by pretreatment on the substrate, embossing the surface relief into the applied thixotropic coating composition with an embossing device, and curing the coating composition following removal of the embossing device. The substrates obtainable by this method, provided with a microstructured surface relief, are particularly suitable for optical, electronic, micromechanical and/or dirt repellency applications.
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