Invention Grant
US06780524B2 In-situ oxidized films for use as gap layers for a spin-valve sensor and methods of manufacture
失效
用作自旋阀传感器的间隙层的原位氧化膜和制造方法
- Patent Title: In-situ oxidized films for use as gap layers for a spin-valve sensor and methods of manufacture
- Patent Title (中): 用作自旋阀传感器的间隙层的原位氧化膜和制造方法
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Application No.: US10066835Application Date: 2002-02-04
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Publication No.: US06780524B2Publication Date: 2004-08-24
- Inventor: Tsann Lin , Daniele Mauri
- Applicant: Tsann Lin , Daniele Mauri
- Main IPC: G11B5127
- IPC: G11B5127

Abstract:
Disclosed is a spin-valve sensor disposed between first and second gap layers and formed of one or more in-situ oxidized films. The improved spin valve sensor helps eliminate electrical shorting between the spin-valve sensor and shield layers. A fabrication method of the gap layers comprises repeatedly depositing a metallic films on a wafer in a DC-magnetron sputtering module of a sputtering system, and then transferring the wafer in a vacuum to an oxidation module where in-situ oxidation is conducted. This deposition/in-situ oxidation process is repeated until a designed thicknesses of gap layers is attained. Smaller, more sensitive spin-valve sensors may be sandwiched between thinner gap layers formed of in-situ oxidized films, thus allowing for greater recording data densities in disk drive systems.
Public/Granted literature
- US20030031894A1 In-situ oxidized films for use as gap layers for a spin-valve sensor and methods of manufacture Public/Granted day:2003-02-13
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