发明授权
- 专利标题: Imaging optical system for oblique incidence interferometer
- 专利标题(中): 用于倾斜入射干涉仪的成像光学系统
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申请号: US10105371申请日: 2002-03-26
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公开(公告)号: US06744523B2公开(公告)日: 2004-06-01
- 发明人: Nobuaki Ueki , Hideo Kanda
- 申请人: Nobuaki Ueki , Hideo Kanda
- 优先权: JP2001-099010 20010330
- 主分类号: G01B902
- IPC分类号: G01B902
摘要:
An imaging optical system for an oblique incidence interferometer comprises first and second optical systems and an intermediate imaging surface therebetween. Each of the first and second imaging optical systems comprises two telecentric lenses, arranged afocal to each other, having respective focal lengths different from each other. A first image of a surface to be inspected having a deformed aspect ratio with respect to this surface is formed on the intermediate imaging surface by way of the first imaging optical system. The second imaging optical system is arranged such that the first image is focused onto the imaging surface of the interferometer as a second image corrected so as to have substantially the same aspect ratio as that of the surface to be inspected.
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