Invention Grant
- Patent Title: Vertical metal-semiconductor microresonator photodetecting device and production method thereof
- Patent Title (中): 垂直金属半导体微谐振器光电探测器及其制作方法
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Application No.: US10169726Application Date: 2002-07-15
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Publication No.: US06713832B2Publication Date: 2004-03-30
- Inventor: Fabrice Pardo , Stéphane Collin , Roland Teissier , Jean-Luc Pelouard
- Applicant: Fabrice Pardo , Stéphane Collin , Roland Teissier , Jean-Luc Pelouard
- Priority: FR0000468 20000114
- Main IPC: H01L310224
- IPC: H01L310224

Abstract:
Device for photodetection with a vertical metal semiconductor microresonator and procedure for the manufacture of this device. According to the invention, in order to detect an incident light, at least one element is formed over an insulating layer (2) that does not absorb this light, including a semiconductor material (6) and at least two electrodes (4) holding the element, with the element and electrode unit being suitable for absorbing this light and designed to incease the light intensity with respect to the incident light, in particular by making a surface plasmon mode resonate between the unit interfaces with the layer and the propagation medium for the incident light, with the resonance of this mode taking place in teh interface between the element and atleast one of the electrodes, with this mode being excited by the component of the magnetic field of the light, parallel to the electrodes. Application for optical telecommunications.
Public/Granted literature
- US20030010979A1 Vertical metal-semiconductor microresonator photodetecting device and production method thereof Public/Granted day:2003-01-16
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