Invention Grant
- Patent Title: Ferroelectric memory device and method of manufacturing the same
- Patent Title (中): 铁电存储器件及其制造方法
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Application No.: US09895205Application Date: 2001-07-02
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Publication No.: US06690598B2Publication Date: 2004-02-10
- Inventor: Koichi Oguchi , Eiji Natori , Kazumasa Hasegawa
- Applicant: Koichi Oguchi , Eiji Natori , Kazumasa Hasegawa
- Priority: JP2000-206588 20000707
- Main IPC: G11C1122
- IPC: G11C1122

Abstract:
A ferroelectric memory device includes a memory cell array and a peripheral circuit section. The memory cell array, in which memory cells are arranged in a matrix, includes first signal electrodes, second signal electrodes which are arranged in a direction so as to intersect the first signal electrodes, and a ferroelectric layer disposed at least at intersection regions between the first signal electrodes and the second signal electrodes. The peripheral circuit section includes circuits for selectively allowing information to be written into or read from the memory cells, such as a first driver circuit, a second driver circuit, and a signal detection circuit. The memory cell array and the peripheral circuit section are disposed in different layers so as to be layered. This ferroelectric memory device can significantly increase the degree of integration of the memory cells and decrease the chip area.
Public/Granted literature
- US20020018357A1 Ferroelectric memory device and method of manufacturing the same Public/Granted day:2002-02-14
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