- 专利标题: Method of producing band-pass filter and band-pass filter
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申请号: US09782981申请日: 2001-02-14
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公开(公告)号: US06556108B2公开(公告)日: 2003-04-29
- 发明人: Seiji Kanba , Naoki Mizoguchi , Hisatake Okamura
- 申请人: Seiji Kanba , Naoki Mizoguchi , Hisatake Okamura
- 优先权: JP2000-047918 20000224
- 主分类号: H01P1203
- IPC分类号: H01P1203
摘要:
A method of producing a band-pass filter includes selecting the shape of a metallic film and the connection points of input-output coupling circuits such that first and second resonance modes are generated in a metallic film provided on a dielectric substrate. At least a portion of the resonance current or the resonance electric field in at least one of the resonance modes is made discontinuous such that the first and second resonance modes are coupled.
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