发明授权
- 专利标题: Water level interconnection
- 专利标题(中): 晶圆级互连
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申请号: US09756801申请日: 2001-01-10
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公开(公告)号: US06512300B2公开(公告)日: 2003-01-28
- 发明人: James L. Cheever , Charles L. Goldsmith , John C. Ehmke , Billy D. Ables
- 申请人: James L. Cheever , Charles L. Goldsmith , John C. Ehmke , Billy D. Ables
- 主分类号: H01L2348
- IPC分类号: H01L2348
摘要:
RF MicroElectroMechanical Systems (MEMs) circuitry(15) on a first high resistivity substrate (17)is combined with circuitry (11) onsecond low-resisitivity substrate (13) by overlapping the first high resisitivity substrate (17)and MEMs circuitry (15) with the low resisitivity substrate(13) and circuitry (11) with the MEMs circuitry (15)facing the second circuitry (11). A dielectric lid (19) is placed over the MEMs circuitry (15)and between the first substrate (17)and second substrate (13)with an inert gas in a gap (21)over the MEMs circuitry (15). Interconnecting conductors (25,31,35,37,39,41) extend perpendicular and through the high resistivity substrate (17)and through the dielectric lid (19) to make electrical connection with the low resisitivity substrate (13).
公开/授权文献
- US20030001251A1 WAFER LEVEL INTERCONNECTION 公开/授权日:2003-01-02
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