Invention Grant
- Patent Title: MOS-type semiconductor device and method for making same
- Patent Title (中): MOS型半导体器件及其制造方法
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Application No.: US09732132Application Date: 2000-12-07
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Publication No.: US06476462B2Publication Date: 2002-11-05
- Inventor: Tatsuo Shimizu , Mieko Matsumura , Shigenobu Kimura , Yutaka Hirose , Yasuhiro Nishioka
- Applicant: Tatsuo Shimizu , Mieko Matsumura , Shigenobu Kimura , Yutaka Hirose , Yasuhiro Nishioka
- Main IPC: H01L2904
- IPC: H01L2904

Abstract:
An MOS-type semiconductor device comprises two semiconductors separated by an insulator. The two semiconductors comprise monocrystal semiconductors, each having a crystallographic orientation with respect to the insulator (or other crystallographic/semiconductor property) different to the crystallographic orientation (or other respective property) of the other semiconductor. This arrangement of crystallographic orientations (and other crystallographic/semiconductor properties) can yield reduced unintended electron tunneling or current leakage through the insulator vis a vis a semiconductor device in which such an arrangement is not used. Methods for forming the MOS-type semiconductor devices of the invention are also provided.
Public/Granted literature
- US20010030354A1 MOS-type semiconductor device and method for making same Public/Granted day:2001-10-18
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