发明授权
- 专利标题： Modified polycyclic polymers
- 专利标题（中）： 改性多环聚合物
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申请号： US09253499申请日： 1999-02-19
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公开(公告)号： US06451945B1公开(公告)日： 2002-09-17
- 发明人: Saikumar Jayaraman , George Martin Benedikt , Larry Funderburk Rhodes , Richard Vicari , Robert David Allen , Richard Anthony DiPietro , Ratnam Sooriyakumaran , Thomas Wallow
- 申请人： Saikumar Jayaraman , George Martin Benedikt , Larry Funderburk Rhodes , Richard Vicari , Robert David Allen , Richard Anthony DiPietro , Ratnam Sooriyakumaran , Thomas Wallow
- 主分类号： C08F13208
- IPC分类号： C08F13208
摘要：
The present invention relates to cyclic polymers and their use in photolithographic applications. The cyclic polymers contain a pendant acid labile functional group and a functional group containing a protected hydroxyl moiety. The polymers are post modified by deprotecting the pendant hydroxyl moiety and reacting the deprotected hydroxyl containing moiety with a coreactant. The post-functionalized polymers find application in chemically amplified photoresist compositions.
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