Invention Grant
- Patent Title: Method to fabricate RF inductors with minimum area
- Patent Title (中): 制造面积最小的射频电感器的方法
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Application No.: US09867561Application Date: 2001-05-31
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Publication No.: US06387747B1Publication Date: 2002-05-14
- Inventor: Randall Cha , Tae Jong Lee , Alex See , Lap Chan , Chua Chee Tee
- Applicant: Randall Cha , Tae Jong Lee , Alex See , Lap Chan , Chua Chee Tee
- Main IPC: H01L218244
- IPC: H01L218244
Abstract:
A method for forming an RF inductor of helical shape having high Q and minimum area. The inductor is fabricated of metal or damascened linear segments formed on three levels of intermetal dielectric layers and interconnected by metal filled vias to form the complete helical shape with electrical continuity.
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