Invention Grant
- Patent Title: Processing method of thermally developable photosensitive material
- Patent Title (中): 热显影感光材料的加工方法
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Application No.: US09237590Application Date: 1999-01-26
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Publication No.: US06387604B2Publication Date: 2002-05-14
- Inventor: Takeshi Sampei
- Applicant: Takeshi Sampei
- Priority: JP10-030563 19980128
- Main IPC: G03C1498
- IPC: G03C1498

Abstract:
A processing method which thermally develops a thermally developable photosensitive material which is exposed imagewise, comprising the step of thermally developing said thermally developable photosensitive material using heating element which intermittently heats and has duration time of surface temperature of not less than 250° C. to be not more than 1 second, wherein said thermally developable photosensitive material comprising a support having thereon one layer or plural layers; containing organic silver salt, photosensitive silver halide grains and a reducing agent.
Public/Granted literature
- US20010018169A1 PROCESSING METHOD OF THERMALLY DEVELOPABLE PHOTOSENSITIVE MATERIAL Public/Granted day:2001-08-30
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