发明授权
US06323381B1 Manufacture of high purity benzene and para-rich xylenes by combining aromatization and selective disproportionation of impure toluene
失效
通过混合不纯的甲苯的芳构化和选择性歧化来制造高纯度苯和对二富集二甲苯
- 专利标题： Manufacture of high purity benzene and para-rich xylenes by combining aromatization and selective disproportionation of impure toluene
- 专利标题（中）： 通过混合不纯的甲苯的芳构化和选择性歧化来制造高纯度苯和对二富集二甲苯
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申请号： US08273933申请日： 1994-07-12
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公开(公告)号： US06323381B1公开(公告)日： 2001-11-27
- 发明人: Gerald J. Nacamuli , Robert A. Innes , Arnold J. Gloyn
- 申请人： Gerald J. Nacamuli , Robert A. Innes , Arnold J. Gloyn
- 主分类号： C07C600
- IPC分类号： C07C600
摘要：
A process is set forth for reacting impure toluene to obtain benzene, toluene and a para-rich xylene stream, which are substantially free of close-boiling non-aromatics. The impure toluene comprises at least 70 wt % toluene and between about 0.2 wt % and about 5 wt % close-boiling non-aromatics. The process may also comprise aromatizing a naphtha over a non-acidic catalyst. The impure toluene from the aromatization step is passed over an acidic intermediate pore zeolite to produce a para-rich xylene stream and chemically pure benzene.
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