发明授权
US06285596B1 Multi-level type nonvolatile semiconductor memory device 有权
多级型非易失性半导体存储器件

  • 专利标题: Multi-level type nonvolatile semiconductor memory device
  • 专利标题(中): 多级型非易失性半导体存储器件
  • 申请号: US09679651
    申请日: 2000-10-05
  • 公开(公告)号: US06285596B1
    公开(公告)日: 2001-09-04
  • 发明人: Hirotomo MiuraYasuo Sato
  • 申请人: Hirotomo MiuraYasuo Sato
  • 优先权: JP9-123058 19970425
  • 主分类号: G11C1604
  • IPC分类号: G11C1604
Multi-level type nonvolatile semiconductor memory device
摘要:
A nonvolatile semiconductor memory device having nonvolatile memory cells, each of said memory cells including a semiconductor substrate of one type of electric conduction, a pair of source and drain regions of the opposite type of electric conduction formed in the semiconductor substrate, an electric charge-capturing film formed on a channel region between the pair of source and drain regions, and a gate electrode formed on the charge-capturing film and working as a control electrode. The electric charge-capturing film has a multi-layer structure in which at least four insulating films and at least three dielectric films each working as an electric charge accumulation layer are alternatingly laminated one upon the other, the lowermost insulating film among the at least four insulating films is formed as a gate-insulating film, a plurality of different threshold voltages are set to the at least three dielectric films to correspond to their electric charge-capturing states, and at least four kinds of memory states are specified depending upon the plurality of threshold voltages. This constitution makes it possible to easily and reliably adjust the amount of electric charge to be captured and, hence, to store desired multi-value data while preventing the occurrence of an inconvenience such as data corruption.
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