发明授权
US6148145A Multi-temperature control system and fluid temperature control device applicable to the same system 有权
多温度控制系统和流体温度控制装置适用于同一系统

  • 专利标题: Multi-temperature control system and fluid temperature control device applicable to the same system
  • 专利标题(中): 多温度控制系统和流体温度控制装置适用于同一系统
  • 申请号: US388896
    申请日: 1999-09-02
  • 公开(公告)号: US6148145A
    公开(公告)日: 2000-11-14
  • 发明人: Kanichi Kadotani
  • 申请人: Kanichi Kadotani
  • 申请人地址: JPX Tokyo
  • 专利权人: Komatsu Ltd.
  • 当前专利权人: Komatsu Ltd.
  • 当前专利权人地址: JPX Tokyo
  • 优先权: JPX7-312048 19951130; JPX8-028021 19960215; JPX8-180102 19960620; JPX8-180103 19960620
  • 主分类号: C23C14/34
  • IPC分类号: C23C14/34 F24H1/10 F24H1/14 A21B2/00
Multi-temperature control system and fluid temperature control device
applicable to the same system
摘要:
A fluid temperature control device is improved to be simpler in structure, less in fluid temperature non-uniformity, and able to heat a fluid having a small light absorbability. The fluid temperature control device has a cylindrical inner vessel (20), a cylindrical outer vessel (22) surrounding the inner vessel (20), and a heating lamp (25) inserted into the inner vessel (20). Metal fins (28a) and (28b) are provided on the inner and outer circumferential surfaces of the inner vessel (20). A working fluid is passed through the inner space (21) between the inner vessel (20) and the heating lamp (25) and a cooling liquid is passed through the outer space (23) between the inner vessel (20) and the outer vessel (22). Infrared rays from the heating lamp (25) heat the working fluid, and the cooling liquid cools the working fluid. This device is applicable to, for instance, temperature control of plural process chambers of semiconductor processing apparatus. A plurality of the temperature control devices are arranged in the vicinity of the semiconductor processing apparatus. Each of the devices is assigned to each of plural portions of the process chambers and provides the temperature-controlled fluid exclusively to each portion.
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