发明授权
- 专利标题: System for cleaning semiconductor device probe
- 专利标题(中): 半导体器件探头清洗系统
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申请号: US27018申请日: 1998-02-20
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公开(公告)号: US6019663A公开(公告)日: 2000-02-01
- 发明人: Larry D. Angell , Andrew J. Krivy
- 申请人: Larry D. Angell , Andrew J. Krivy
- 申请人地址: ID Boise
- 专利权人: Micron Technology Inc
- 当前专利权人: Micron Technology Inc
- 当前专利权人地址: ID Boise
- 主分类号: B24B19/16
- IPC分类号: B24B19/16 ; B24B19/22 ; B24B37/34 ; G01R3/00 ; B24B49/00
摘要:
A system and method for cleaning probe pins on a probe card used in testing a semiconductor device during fabrication thereof. A ceramic cleaning wafer is utilized to clean the probe pins without having to remove the probe card from a production line. The same apparatus used to test production wafers also handles the cleaning wafer during a probe cleaning cycle. During operation of the cleaning cycle, the cleaning wafer is placed in a manual load tray, which inserts the cleaning wafer into a prober machine. The cleaning wafer is transported by a robotic trolley to a prealign stage area where the cleaning wafer is aligned and centered. The cleaning wafer is then placed on a support device. The support device and cleaning wafer are positioned under a pneumatic sensor and profiled to determine wafer planarity. The support device and cleaning wafer are then positioned underneath the probe pins on the probe card to be cleaned. Thereafter, the z-axis distance between the probe pins and the surface of the cleaning wafer is decreased such that the probe pins contact the cleaning wafer, thereby removing debris from the probe pins. The cleaning wafer is then removed from the support device when cleaning of the probe pins has been completed.
公开/授权文献
- USD361902S Chair 公开/授权日:1995-09-05
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