Invention Grant
US5344462A Gas plasma treatment for modification of surface wetting properties
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用于改变表面润湿性能的气体等离子体处理
- Patent Title: Gas plasma treatment for modification of surface wetting properties
- Patent Title (中): 用于改变表面润湿性能的气体等离子体处理
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Application No.: US864434Application Date: 1992-04-06
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Publication No.: US5344462APublication Date: 1994-09-06
- Inventor: Georgy Z. Paskalov , Svetlana A. Krapivina , Alexander K. Filippov
- Applicant: Georgy Z. Paskalov , Svetlana A. Krapivina , Alexander K. Filippov
- Applicant Address: CA Los Angeles
- Assignee: Plasma Plus
- Current Assignee: Plasma Plus
- Current Assignee Address: CA Los Angeles
- Main IPC: B29C59/14
- IPC: B29C59/14 ; D06M10/02 ; D21H25/04 ; D06M10/06 ; D06M11/05 ; D06M11/34
Abstract:
Efficiency of low pressure gas plasma processes is increased by addition of small quantities of water vapor to the primary gas constituting the plasma. Treated fabrics and polymer films show decreased wetting angle and increased capillary absorption, which beneficially affects the material's susceptibility to dyeing and impregnation.
Public/Granted literature
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