Invention Grant
- Patent Title: Multi-channel gas sample chamber
- Patent Title (中): 多通道气体样品室
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Application No.: US816596Application Date: 1991-12-31
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Publication No.: US5222389APublication Date: 1993-06-29
- Inventor: Jacob Y. Wong
- Applicant: Jacob Y. Wong
- Applicant Address: CA Goleta
- Assignee: Gaztech International Corporation
- Current Assignee: Gaztech International Corporation
- Current Assignee Address: CA Goleta
- Main IPC: G01N1/00
- IPC: G01N1/00 ; G01N1/22 ; G01N21/03 ; G01N21/05 ; G01N21/35 ; G01N21/61 ; G01N21/85 ; G01N33/00 ; G08B17/117 ; G08B29/20
Abstract:
A gas sample chamber for use in a gas analyzer consists of an elongated hollow tube having an inwardly-facing specularly-reflective surface that permits the tube to function also as a light pipe for conducting radiation from a source to a detector through the sample gas. A number of apertures in the wall of the elongated hollow tube permit the sample gas to enter and exit. Particles of smoke and dust of a size greater than 0.1 micron are kept out of the chamber by use of a semi-permeable membrane that spans the apertures in the hollow tube. Condensation of the sample gas components is prevented by heating the sample chamber electrically to a temperature above the dew point of the component of concern. In one embodiment, at least one detector are spaced around the periphery of the elongated hollow tube adjacent one end of it. In another embodiment, at least one detector are spaced along the length of the elongated hollow tube.
Public/Granted literature
- US5985708A Method of manufacturing vertical power device Public/Granted day:1999-11-16
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