Invention Grant
- Patent Title: Method of producing a naphthol-modified phenolic resin of highly increased molecular weight
- Patent Title (中): 生产高分子量重量的萘酚改性酚醛树脂的方法
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Application No.: US879363Application Date: 1992-05-07
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Publication No.: US5206333APublication Date: 1993-04-27
- Inventor: Haruaki Sue , Ken Nanaumi , Takuji Itou , Ken Madarame , Shinsuke Hagiwara
- Applicant: Haruaki Sue , Ken Nanaumi , Takuji Itou , Ken Madarame , Shinsuke Hagiwara
- Applicant Address: JPX Tokyo
- Assignee: Hitachi Chemical Company, Ltd.
- Current Assignee: Hitachi Chemical Company, Ltd.
- Current Assignee Address: JPX Tokyo
- Priority: JPX3-101152 19910507; JPX3-101153 19910507
- Main IPC: C08G8/08
- IPC: C08G8/08
Abstract:
A copolycondensation of a phenol, a naphthol and formaldehyde proceeds smoothly in the presence of an acid and a metallic element selected from the group consisting of transition metallic elements and metallic elements of Group IIa, Group IIIa, Group IVa, Group Va and Group VIa of the Periodic Table, and a naphthol-modified phenolic resin which has a large molecular weight and does not gel is obtained.
Public/Granted literature
- US5918141A Method of masking silicide deposition utilizing a photoresist mask Public/Granted day:1999-06-29
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