Invention Grant
- Patent Title: Positive photosensitive planographic printing plates containing specific high-molecular weight compound and photosensitive ester of O-napthoquinonediazidosulfonic acid with polyhydroxybenzophenone
- Patent Title (中): 含有特定高分子量化合物和O-萘醌二叠氮磺酸与多羟基二苯甲酮的感光酯的感光平版印刷版
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Application No.: US789550Application Date: 1991-11-08
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Publication No.: US5182183APublication Date: 1993-01-26
- Inventor: Hiroshi Tomiyasu , Yoshiko Kobayashi , Kiyoshi Goto , Takeshi Yamamoto , Hideyuki Nakai
- Applicant: Hiroshi Tomiyasu , Yoshiko Kobayashi , Kiyoshi Goto , Takeshi Yamamoto , Hideyuki Nakai
- Applicant Address: JPX Tokyo JPX Tokyo
- Assignee: Mitsubishi Kasei Corporation,Konica Corporation
- Current Assignee: Mitsubishi Kasei Corporation,Konica Corporation
- Current Assignee Address: JPX Tokyo JPX Tokyo
- Priority: JPX62-57282 19870312; JPX62-111413 19870507; JPX62-120592 19870518; JPX62-139140 19870603
- Main IPC: G03F7/023
- IPC: G03F7/023
Abstract:
A positive photosensitive planographic printing plate is disclosed which has a photosensitive layer comprising in combination a specific o-naphthoquinonediazidosulfonic ester and a resin having a specific structural unit(s). Said photosensitive layer may also contain a novolak resin and/or an organic acid.
Public/Granted literature
- USD298931S Electrical plug Public/Granted day:1988-12-13
Information query
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