发明授权
- 专利标题： Low pressure mercury vapor discharge lamp and preparation thereof
- 专利标题（中）： 低压汞汽放电灯及其制备
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申请号： US195380申请日： 1988-05-12
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公开(公告)号： US4840593A公开(公告)日： 1989-06-20
- 发明人: Takao Takeda , Hitoshi Yamazaki , Yoshiteru Taniguchi , Norihiko Tanaka , Hiroshi Ito , Minoru Uchida , Jun Imai
- 申请人： Takao Takeda , Hitoshi Yamazaki , Yoshiteru Taniguchi , Norihiko Tanaka , Hiroshi Ito , Minoru Uchida , Jun Imai
- 申请人地址： JPX Tokyo
- 专利权人： Mitsubishi Denki Kabushiki Kaisha
- 当前专利权人： Mitsubishi Denki Kabushiki Kaisha
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX58-147618 19830812; JPX58-147619 19830812; JPX58-163611 19830906; JPX59-26486 19840215; JPX59-26487 19840215; JPX59-26646 19840215
- 主分类号： H01J9/26
- IPC分类号： H01J9/26 ; H01J9/34 ; H01J9/385 ; H01J9/40 ; H01J61/00 ; H01J61/30 ; H01J61/32 ; H01J61/36 ; H01J61/72
摘要：
A process is disclosed which prepares a low pressure mercury vapor discharge lamp having a bulb and an end plate connected to the bottom of the bulb. The steps involve the application of an adhesive on one surface of the end plate, and the subsequent insertion of an exhaust tube into the end plate in such a way that an enlarged diameter portion of the exhust tube has an adhesive formed on this portion. As a result of the location and the structure of the steps, it is possible to provide a single step method of heating which functions to perform the essential bonding of all parts.
公开/授权文献
- US4377734A Method for forming patterns by plasma etching 公开/授权日：1983-03-22
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