发明授权
US4755345A Impedance matched, high-power, rf antenna for ion cyclotron resonance
heating of a plasma
失效
阻抗匹配,大功率,射频天线用于等离子体的离子回旋共振加热
- 专利标题: Impedance matched, high-power, rf antenna for ion cyclotron resonance heating of a plasma
- 专利标题(中): 阻抗匹配,大功率,射频天线用于等离子体的离子回旋共振加热
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申请号: US891833申请日: 1986-08-01
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公开(公告)号: US4755345A公开(公告)日: 1988-07-05
- 发明人: Frederick W. Baity, Jr. , Daniel J. Hoffman , Thomas L. Owens
- 申请人: Frederick W. Baity, Jr. , Daniel J. Hoffman , Thomas L. Owens
- 申请人地址: DC Washington
- 专利权人: The United States of America as represented by the United States Department of Energy
- 当前专利权人: The United States of America as represented by the United States Department of Energy
- 当前专利权人地址: DC Washington
- 主分类号: H01Q7/00
- IPC分类号: H01Q7/00 ; H05H1/18 ; G21B1/00
摘要:
A resonant double loop radio frequency (rf) antenna for radiating high-power rf energy into a magnetically confined plasma. An inductive element in the form of a large current strap, forming the radiating element, is connected between two variable capacitors to form a resonant circuit. A real input impedance results from tapping into the resonant circuit along the inductive element, generally near the midpoint thereof. The impedance can be matched to the source impedance by adjusting the separate capacitors for a given tap arrangement or by keeping the two capacitances fixed and adjustng the tap position. This results in a substantial reduction in the voltage and current in the transmission system to the antenna compared to unmatched antennas. Because the complete circuit loop consisting of the two capacitors and the inductive element is resonant, current flows in the same direction along the entire length of the radiating element and is approximately equal in each branch of the circuit. Unidirectional current flow permits excitation of low order poloidal modes which penetrate more deeply into the plasma.
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