Invention Grant
- Patent Title: Field effect transistor
- Patent Title (中): 场效应晶体管
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Application No.: US59785Application Date: 1987-06-08
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Publication No.: US4746961APublication Date: 1988-05-24
- Inventor: Nobutake Konishi , Kenji Miyata , Yoshikazu Hosokawa , Takaya Suzuki , Akio Mimura
- Applicant: Nobutake Konishi , Kenji Miyata , Yoshikazu Hosokawa , Takaya Suzuki , Akio Mimura
- Applicant Address: JPX Tokyo
- Assignee: Hitachi, Ltd.
- Current Assignee: Hitachi, Ltd.
- Current Assignee Address: JPX Tokyo
- Priority: JPX61-133689 19860611
- Main IPC: H01L27/12
- IPC: H01L27/12 ; G02F1/1368 ; H01L29/08 ; H01L29/78 ; H01L29/786 ; H01L29/161 ; H01L29/12
Abstract:
This invention relates to the structure of a field effect transistor, which is suitable for liquid crystal display of an active matrix scheme and there is disclosed a new structure for the field effect transistor, in which at least one of the source region and the drain region is of multi-layered structure, in which high impurity concentration portions and low impurity concentration portions are alternately superposed on each other.
Public/Granted literature
- US4239318A Electrical connector shield Public/Granted day:1980-12-16
Information query
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