Invention Grant
US4412907A Ferromagnetic high speed sputtering apparatus 失效
铁磁高速溅射装置

Ferromagnetic high speed sputtering apparatus
Abstract:
A ferromagnetic, high speed, sputtering apparatus is provided which comprises a vacuum chamber and a target of ferromagnetic material. The target comprises at least two segments which are positioned adjacent to one another and have a gap therebetween. This gap has at least a portion of which that does not extend in the direction of the thickness of the target. A substrate in the vacuum chamber is positioned facing one side of the target. Also, magnetic field generating means is positioned on the other side of the target so that the magnetic field therefrom leaks through the gap.
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