发明授权
- 专利标题: Electron optics apparatus
- 专利标题(中): 电子光学装置
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申请号: US894757申请日: 1978-04-10
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公开(公告)号: US4196373A公开(公告)日: 1980-04-01
- 发明人: Harold G. Parks
- 申请人: Harold G. Parks
- 申请人地址: NY Schenectady
- 专利权人: General Electric Company
- 当前专利权人: General Electric Company
- 当前专利权人地址: NY Schenectady
- 主分类号: H01J29/46
- IPC分类号: H01J29/46 ; H01J29/56
摘要:
Electron optics apparatus, for use in electron-beam lithography, electron-beam-addressable memory tubes and the like, utilizes a tri-potential collimating condenser lens and a multi-element matrix lens of the "flys eye" type with coarse deflection elements positioned therebetween to deflect the collimated electron beam from the condenser lens to the appropriate aperture in the matrix of lenslets. The condenser lens electrode and matrix lens electrode closest to one another, as well as the coarse deflection electrodes therebetween, are substantially the only elements in the apparatus which float at a relatively high electrical potential, thereby simplifying the requirements of peripheral circuitry while retaining the advantages of the "flys eye" matrix lens.
公开/授权文献
- US5266652A Resinous composition for powder coating 公开/授权日:1993-11-30
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