Invention Application
- Patent Title: INTERCONNECT STRUCTURE AND ELECTRONIC DEVICE INCLUDING THE SAME
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Application No.: US18796804Application Date: 2024-08-07
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Publication No.: US20250054866A1Publication Date: 2025-02-13
- Inventor: Keun Wook SHIN , Sangwon KIM , Chang Seok LEE , Joonseok KIM , Joonyun KIM , Giyoung JO , Luhing HU
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Priority: KR10-2023-0103154 20230807
- Main IPC: H01L23/532
- IPC: H01L23/532 ; H01L23/528

Abstract:
Disclosed are an interconnect structure including a substrate, a metal layer on the substrate, and a passivation layer including a topological compound and in contact with the metal layer.
Information query
IPC分类: