Invention Publication
- Patent Title: THREE-DIMENSIONAL MEMORY DEVICE AND MANUFACTURING METHOD THEREOF
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Application No.: US18763239Application Date: 2024-07-03
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Publication No.: US20240357838A1Publication Date: 2024-10-24
- Inventor: Chao-I Wu , Yu-Ming Lin
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsinchu
- Main IPC: H10B63/00
- IPC: H10B63/00 ; H10N70/00

Abstract:
A three-dimensional memory device includes a stacking structure, memory pillars, and conductive pillars. The stacking structure includes stacking layers stacked along a vertical direction, each stacking layer including a gate layer, a gate dielectric layer, and a channel layer. The gate layer, the gate dielectric layer, and the channel layer extend along a horizontal direction, and the gate dielectric layer is disposed between the gate layer and the channel layer. The memory pillars extend along the vertical direction and are laterally separated and in contact with the channel layer of each stacking layer. Each memory pillar comprises a first electrode, a second electrode, and a switching layer between the first and second electrodes. The conductive pillars extend along the vertical direction and are laterally separated and in contact with the channel layer of each stacking layer. The memory pillars and the conductive pillars are alternately arranged along the horizontal direction.
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