发明公开
- 专利标题: PROCESSING SYSTEM
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申请号: US18624410申请日: 2024-04-02
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公开(公告)号: US20240342922A1公开(公告)日: 2024-10-17
- 发明人: Kento TOKAIRIN
- 申请人: Tokyo Electron Limited
- 申请人地址: JP Tokyo
- 专利权人: Tokyo Electron Limited
- 当前专利权人: Tokyo Electron Limited
- 当前专利权人地址: JP Tokyo
- 优先权: JP 23066633 2023.04.14
- 主分类号: B25J13/08
- IPC分类号: B25J13/08 ; B25J9/16 ; B25J11/00 ; B25J15/00 ; B25J15/06
摘要:
A disclosed processing system includes a substrate placing stage, at least one measurer, and a determiner. The substrate placing stage is configured to place a substrate transferred by a transfer device thereon. The at least one measurer measures a load applied to the substrate placing stage from the substrate when the substrate is transferred from the transfer device onto the substrate placing stage. The determiner determines a suitability of a fixed state of the substrate to the transfer device based on the load measured by the at least one measurer.
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