发明公开
- 专利标题: GROWTH SUBSTRATE AND METHOD FOR MANUFACTURING AN OPTOELECTRONIC SEMICONDUCTOR BODY
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申请号: US18546063申请日: 2022-03-02
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公开(公告)号: US20240234136A9公开(公告)日: 2024-07-11
- 发明人: Jelena Ristic
- 申请人: ams-OSRAM International GmbH
- 申请人地址: DE Regensburg
- 专利权人: ams-OSRAM International GmbH
- 当前专利权人: ams-OSRAM International GmbH
- 当前专利权人地址: DE Regensburg
- 优先权: DE 2021202708.3 2021.03.19
- 国际申请: PCT/EP2022/055282 2022.03.02
- 进入国家日期: 2023-08-10
- 主分类号: H01L21/02
- IPC分类号: H01L21/02 ; H01L31/18 ; H01L33/00
摘要:
In an embodiment a growth substrate includes a substrate and a buffer layer sequence having a plurality of semiconductor layers based on a nitride semiconductor compound material and a plurality of buffer layers, wherein the semiconductor layers and the buffer layers are arranged alternatingly, and wherein the buffer layers comprise at least one of the following two-dimensional layered materials: graphene, boron nitride, MoS2, WSe2 or fluorographene.
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