- 专利标题: SUBSTRATE PROCESSING TUBE, SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, AND SUBSTRATE PROCESSING METHOD USING THE APPARATUS
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申请号: US18125435申请日: 2023-03-23
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公开(公告)号: US20240011154A1公开(公告)日: 2024-01-11
- 发明人: HYUNJU LEE , BYEONGHOON KIM , HYOUNCHEOL KIM , JAEHYUNG LEE , BYUNGHWAN KONG
- 申请人: Samsung Electronics Co., Ltd.
- 申请人地址: KR Suwon-si
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Suwon-si
- 优先权: KR 20220084031 2022.07.07
- 主分类号: C23C16/455
- IPC分类号: C23C16/455 ; H01L21/673 ; C23C16/458 ; C23C16/46
摘要:
A substrate processing apparatus may include an inner tube providing a process space extending vertically, an outer tube enclosing the inner tube, a gas supplying conduit connected to the process space, and a boat configured to be disposed in the process space. A first inner diameter of the inner tube at a first position may be different from a second inner diameter of the inner tube at a second position, and a level of the second position may be higher than a level of the first position.
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