A simulation apparatus that predicts a behavior of a curable composition in a film forming process includes a processor configured to execute behavior computation of the curable composition by a computational method selected from a first computational method and a second computational method which shortens a computation time as compared to the first computational method. The processor is configured to execute behavior computation of the curable composition by the second computational method while applying each of a plurality of tentative parameter sets for the film forming process, decide, from the plurality of tentative parameter sets, a parameter set that produces a result of the behavior computation satisfying a predetermined criterion for evaluation, and execute behavior computation of the curable composition by the first computational method while applying the decided parameter set.