发明公开
- 专利标题: PHOTOCURABLE COMPOSITION
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申请号: US17664037申请日: 2022-05-18
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公开(公告)号: US20230374167A1公开(公告)日: 2023-11-23
- 发明人: Fen Wan , Weijun Liu , Timothy Brian Stachowiak
- 申请人: Canon Kabushiki Kaisha
- 申请人地址: JP Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JP Tokyo
- 主分类号: C08F2/50
- IPC分类号: C08F2/50 ; C08F212/36 ; C08K5/3417 ; C08K5/13 ; C08F222/10
摘要:
A photocurable composition can comprise a polymerizable material and at least one photoinitiator, wherein the polymerizable material comprises a multi-functional vinylbenzene monomer in an amount of at least 30 wt % based on the total weight of the polymerizable material and the at least one photoinitiator includes an oxime ester compound. The photocurable composition can be adapted that a UV shrinkage after forming a photo-cured layer at 23° C. is not greater than 4.0%; and that a thermal shrinkage after conducting a baking treatment of the photo-cured layer at 350° C. is not greater than 3.5%.
公开/授权文献
- US11981759B2 Photocurable composition 公开/授权日:2024-05-14
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