- 专利标题: MOTORIZED CHUCK STAGE CONTROLLING METHOD
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申请号: US18121475申请日: 2023-03-14
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公开(公告)号: US20230314505A1公开(公告)日: 2023-10-05
- 发明人: Sebastian Giessmann , Yu-Hsun Hsu
- 申请人: MPI Corporation
- 申请人地址: TW Hsinchu County
- 专利权人: MPI Corporation
- 当前专利权人: MPI Corporation
- 当前专利权人地址: TW Hsinchu County
- 优先权: TW 1112056 2022.03.29
- 主分类号: G01R31/308
- IPC分类号: G01R31/308 ; B23Q3/16 ; G01R31/28
摘要:
A motorized chuck stage controlling method adapted to a wafer probing device is provided. The wafer probing device includes a control rod and a motorized chuck stage. The control rod can be moved between an upper limit position and a lower limit position, and the motorized chuck stage is moved along a Z-axis direction in response to a movement of the control rod. One purpose of the motorized chuck stage controlling method is to allow the operator to define the highest position to which the motorized chuck stage can be moved in response to the movement of the control rod, thereby preventing the probe and the wafer from colliding with each other.
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