- 专利标题: Photomask, Optical-Waveguide, Optical Circuit and Method of Manufacturing an Optical-Waveguide
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申请号: US18040034申请日: 2020-08-05
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公开(公告)号: US20230259017A1公开(公告)日: 2023-08-17
- 发明人: Takashi Go , Ai Yanagihara , Keita Yamaguchi , Kenya Suzuki
- 申请人: Nippon Telegraph and Telephone Corporation
- 申请人地址: JP Tokyo
- 专利权人: Nippon Telegraph and Telephone Corporation
- 当前专利权人: Nippon Telegraph and Telephone Corporation
- 当前专利权人地址: JP Tokyo
- 国际申请: PCT/JP2020/030071 2020.08.05
- 进入国家日期: 2023-01-31
- 主分类号: G03F1/42
- IPC分类号: G03F1/42 ; G03F9/00 ; G02B6/13
摘要:
In an optical circuit divided into a plurality of partial circuits, an optical waveguide having a low optical loss at a connection portion is provided. A photomask in which a waveguide pattern of an optical circuit is divided into a plurality of regions and drawn, the photomask including a waveguide pattern for drawing a joint region in which a waveguide width changes as a waveguide goes toward an outer peripheral portion, to connect a plurality of the waveguides divided and drawn to each other, in which the waveguides are connected to each other by overlapping the joint regions of two of the photomasks and performing exposure.
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