- 专利标题: PACKAGE STRUCTURE INCLUDING IPD AND METHOD OF FORMING THE SAME
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申请号: US18155705申请日: 2023-01-17
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公开(公告)号: US20230154881A1公开(公告)日: 2023-05-18
- 发明人: Hua-Wei Tseng , Yueh-Ting Lin , Shao-Yun Chen , Li-Hsien Huang , An-Jhih Su , Ming-Shih Yeh , Der-Chyang Yeh
- 申请人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 申请人地址: TW Hsinchu
- 专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址: TW Hsinchu
- 主分类号: H01L23/00
- IPC分类号: H01L23/00
摘要:
A package structure including IPD and method of forming the same are provided. The package structure includes a die, an encapsulant laterally encapsulating the die, a first RDL structure disposed on the encapsulant and the die, an IPD disposed on the first RDL structure and an underfill layer. The IPD includes a substrate, a first connector on a first side of the substrate and electrically connected to the first RDL structure, a guard structure on a second side of the substrate opposite to the first side and laterally surrounding a connector region, and a second connector disposed within the connector region and electrically connected to a conductive via embedded in the substrate. The underfill layer is disposed to at least fill a space between the first side of the IPD and the first RDL structure. The underfill layer is separated from the connector region by the guard structure.
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