Invention Application
- Patent Title: SUBSTRATE AND METHOD OF MANUFACTURING SUBSTRATE
-
Application No.: US17857332Application Date: 2022-07-05
-
Publication No.: US20230008405A1Publication Date: 2023-01-12
- Inventor: Mitsunori Toshishige , Yoshiyuki Fukumoto
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: CANON KABUSHIKI KAISHA
- Current Assignee: CANON KABUSHIKI KAISHA
- Current Assignee Address: JP Tokyo
- Priority: JP2021-114950 20210712,JP2022-094250 20220610
- Main IPC: H01L23/544
- IPC: H01L23/544

Abstract:
Provided is a method of manufacturing a substrate including an alignment mark, including: forming the alignment mark and a recess portion on the substrate, the alignment mark not penetrating the substrate and including a bottom portion with a lower infrared transmittance than that of a first surface and a second surface of the substrate; and aligning the substrate by orthogonally arranging predetermined positions of the first surface and the second surface of the substrate in a horizontal direction and an infrared ray camera and by image-identifying the alignment mark formed on the substrate with transmitted light of infrared rays emitted from the infrared ray camera.
Information query
IPC分类: