Invention Application
- Patent Title: ACTIVE DEVICE LAYER AT INTERCONNECT INTERFACES
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Application No.: US17344348Application Date: 2021-06-10
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Publication No.: US20220399324A1Publication Date: 2022-12-15
- Inventor: Han Wui Then , Adel A. Elsherbini , Kimin Jun , Johanna M. Swan , Shawna M. Liff , Sathya Narasimman Tiagaraj , Gerald S. Pasdast , Aleksandar Aleksov , Feras Eid
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Main IPC: H01L25/00
- IPC: H01L25/00 ; H01L25/065 ; H01L23/00

Abstract:
A die assembly comprising: a first component layer having conductive through-connections in an insulator, a second component layer comprising a die, and an active device layer (ADL) at an interface between the first component layer and the second component layer. The ADL comprises active elements electrically coupled to the first component layer and the second component layer. The die assembly further comprises a bonding layer electrically coupling the ADL to the second component layer. In some embodiments, the die assembly further comprises another ADL at another interface between the first component layer and a package support opposite to the interface. The first component layer may comprise another die having through-substrate vias (TSVs). The die and the another die may be fabricated using different process nodes.
Information query
IPC分类: