Invention Application
- Patent Title: SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
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Application No.: US17863437Application Date: 2022-07-13
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Publication No.: US20220352355A1Publication Date: 2022-11-03
- Inventor: Shunpei YAMAZAKI , Takahiro TSUJI , Kunihiko SUZUKI
- Applicant: Semiconductor Energy Laboratory Co., Ltd.
- Applicant Address: JP Atsugi-shi
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-shi
- Priority: JP2009-218904 20090924
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L27/12 ; H01L29/786 ; H01L21/66 ; H01L21/02 ; H01L29/04

Abstract:
An object is to provide a high reliability thin film transistor using an oxide semiconductor layer which has stable electric characteristics. In the thin film transistor in which an oxide semiconductor layer is used, the amount of change in threshold voltage of the thin film transistor before and after a BT test is made to be 2 V or less, preferably 1.5 V or less, more preferably 1 V or less, whereby the semiconductor device which has high reliability and stable electric characteristics can be manufactured. In particular, in a display device which is one embodiment of the semiconductor device, a malfunction such as display unevenness due to change in threshold voltage can be reduced.
Public/Granted literature
- US12113124B2 Semiconductor device and method for manufacturing the same Public/Granted day:2024-10-08
Information query
IPC分类: