Invention Application
- Patent Title: EM SOURCE FOR ENHANCED PLASMA CONTROL
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Application No.: US17861969Application Date: 2022-07-11
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Publication No.: US20220341029A1Publication Date: 2022-10-27
- Inventor: Alexander Jansen , Keith A. Miller , Prashanth Kothnur , Martin Riker , David Gunther , Emily Schooley
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Main IPC: C23C14/35
- IPC: C23C14/35 ; C23C14/34
Abstract:
Apparatus and methods for controlling plasma profiles during PVD deposition processes are disclosed. Some embodiments utilize EM coils placed above the target to control the plasma profile during deposition.
Information query
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