- 专利标题: MEMORY AND METHOD FOR MANUFACTURING MEMORY
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申请号: US17447198申请日: 2021-09-08
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公开(公告)号: US20220285352A1公开(公告)日: 2022-09-08
- 发明人: Tao CHEN
- 申请人: CHANGXIN MEMORY TECHNOLOGIES, INC.
- 申请人地址: CN Hefei City
- 专利权人: CHANGXIN MEMORY TECHNOLOGIES, INC.
- 当前专利权人: CHANGXIN MEMORY TECHNOLOGIES, INC.
- 当前专利权人地址: CN Hefei City
- 优先权: CN202110241856.8 20210304
- 主分类号: H01L27/108
- IPC分类号: H01L27/108
摘要:
A memory includes a substrate. An isolation layer is disposed on the substrate. The plurality of active regions arranged in an array are disposed in the isolation layer. A plurality of word lines are formed in the plurality of active regions and the isolation layer. Each word line includes gates disposed in the active regions and word line structures disposed in the isolation layer. The each word line is constituted by successive connection of the plurality of gates and the plurality of word line structures arranged at intervals. The plurality of gates included in the each word line are disposed in two correspondingly adjacent columns of active regions, and any two adjacent gates in the each word line are disposed in two correspondingly adjacent rows of active regions.
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