Invention Application
- Patent Title: MRAM STRUCTURE AND METHOD OF FABRICATING THE SAME
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Application No.: US17725511Application Date: 2022-04-20
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Publication No.: US20220246839A1Publication Date: 2022-08-04
- Inventor: Da-Jun Lin , Min-Hua Tsai , Tai-Cheng Hou , Fu-Yu Tsai , Bin-Siang Tsai
- Applicant: UNITED MICROELECTRONICS CORP.
- Applicant Address: TW Hsin-Chu City
- Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee Address: TW Hsin-Chu City
- Priority: CN202010776346.6 20200805
- Main IPC: H01L43/02
- IPC: H01L43/02 ; H01L43/12 ; H01L27/22

Abstract:
An MRAM structure includes a dielectric layer. A first MRAM, a second MRAM and a third MRAM are disposed on the dielectric layer, wherein the second MRAM is disposed between the first MRAM and the third MRAM, and the second MRAM includes an MTJ. Two gaps are respectively disposed between the first MRAM and the second MRAM and between the second MRAM and the third MRAM. Two tensile stress pieces are respectively disposed in each of the two gaps. A first compressive stress layer surrounds and contacts the sidewall of the MTJ entirely. A second compressive stress layer covers the openings of each of the gaps and contacts the two tensile material pieces.
Public/Granted literature
- US12016250B2 MRAM structure and method of fabricating the same Public/Granted day:2024-06-18
Information query
IPC分类: