- 专利标题: METHOD AND MANUFACTURING SYSTEM OF PRODUCING MICROELECTRONIC COMPONENTS WITH A LAYER STRUCTURE
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申请号: US17590313申请日: 2022-02-01
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公开(公告)号: US20220216364A1公开(公告)日: 2022-07-07
- 发明人: Sven Albert , René Boettcher , Alexander Boehm , Mike Lindner , Thomas Schmidt
- 申请人: 3D-Micromac AG
- 申请人地址: DE Chemnitz
- 专利权人: 3D-Micromac AG
- 当前专利权人: 3D-Micromac AG
- 当前专利权人地址: DE Chemnitz
- 优先权: DE102017205635.5 20170403
- 主分类号: H01L33/00
- IPC分类号: H01L33/00 ; B32B43/00 ; H01L21/67 ; H01L21/683 ; H01L21/66
摘要:
A method of producing microelectronic components includes forming a functional layer system; applying a laminar carrier to the functional layer system; attaching a workpiece to a workpiece carrier; utilizing incident radiation of a laser beam is focused in a boundary region between a growth substrate and the functional layer system, and a bond between the growth substrate and the functional layer system in the boundary region is weakened or destroyed; separating a functional layer stack from the growth substrate, wherein a vacuum gripper having a sealing zone that circumferentially encloses an inner region is applied to the reverse side of the growth substrate, a negative pressure is generated in the inner region such that separation of the functional layer stack from the growth substrate is initiated in the inner region; and the growth substrate held on the vacuum gripper is removed from the functional layer stack.
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