Invention Application
- Patent Title: SYSTEM AND METHOD FOR ALIGNMENT OF SECONDARY BEAMS IN MULTI-BEAM INSPECTION APPARATUS
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Application No.: US17598841Application Date: 2020-03-06
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Publication No.: US20220189726A1Publication Date: 2022-06-16
- Inventor: Qingpo XI , Xuerang HU , Xuedong LIU , Weiming REN , Zhong-wei CHEN
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- International Application: PCT/EP2020/055959 WO 20200306
- Main IPC: H01J37/147
- IPC: H01J37/147 ; H01J37/05

Abstract:
A multi-beam inspection apparatus including an adjustable beam separator is disclosed. The adjustable beam separator is configured to change a path of a secondary particle beam. The adjustable beam separator comprises a first Wien filter and a second Wien filter. Both Wien filters are aligned with a primary optical axis. The first Wien filter and the second Wien filter are independently controllable via a first excitation input and a second excitation input, respectively. The adjustable beam separator is configured move the effective bending point of the adjustable beam separator along the primary optical axis based on the first excitation input and the second excitation input.
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