Invention Application
- Patent Title: ARRAY SUBSTRATE, METHOD OF MANUFACTURING SAME, AND DISPLAY PANEL
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Application No.: US16954253Application Date: 2019-12-30
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Publication No.: US20220149085A1Publication Date: 2022-05-12
- Inventor: Juncheng Xiao , Fei Ai , Guoheng Yin , Yong Xu
- Applicant: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Applicant Address: CN Wuhan
- Assignee: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Wuhan
- Priority: CN201911029531.2 20191028
- International Application: PCT/CN2019/129773 WO 20191230
- Main IPC: H01L27/12
- IPC: H01L27/12

Abstract:
The present invention provides a TFT array substrate, a manufacturing method thereof, and a display panel thereof, wherein the thin-film transistor (TFT) array substrate is defined with a first area and a second area, and includes a substrate layer, wherein a first TFT is disposed on the substrate layer in the first area, and a second TFT is disposed on the substrate layer in the second area; and wherein the first TFT is a top-gate TFT, the second TFT is a bottom-gate TFT, and a material used for a source/drain layer of the first TFT is same as a material used for a gate layer of the second TFT. The present invention provides a TFT array substrate, which adopts a novel film structure design, so that a low temperature poly-silicon (LTPS) TFT and Oxide TFT provided thereon can have great compatibility in the design and manufacturing process.
Information query
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