- 专利标题: SEMICONDUCTOR MEMORY AND METHOD OF MANUFACTURING THE SEMICONDUCTOR MEMORY
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申请号: US17503947申请日: 2021-10-18
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公开(公告)号: US20220037217A1公开(公告)日: 2022-02-03
- 发明人: Naoki YAMAMOTO , Yu HIROTSU
- 申请人: Toshiba Memory Corporation
- 申请人地址: JP Tokyo
- 专利权人: Toshiba Memory Corporation
- 当前专利权人: Toshiba Memory Corporation
- 当前专利权人地址: JP Tokyo
- 优先权: JP2018-137888 20180723
- 主分类号: H01L21/66
- IPC分类号: H01L21/66 ; H01L21/768 ; H01L27/11565 ; H01L27/11575 ; H01L27/11582
摘要:
A semiconductor memory according to an embodiment includes first and second areas, an active region, a non-active region, a first stacked body, a plurality of first pillars, a first contact, a second stacked body, and a second contact. The active region includes part of each of the first and second areas. The non-active region includes part of each of the first and second areas. The second stacked body is in the non-active region. The second stacked body includes second insulators and second conductors which are alternately stacked. A second contact is in contact with a second conductor in a first interconnect layer and a second conductor in a second interconnect layer.
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