- 专利标题： RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
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申请号： US17089298申请日： 2020-11-04
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公开(公告)号： US20210141308A1公开(公告)日： 2021-05-13
- 发明人: Tsuyoshi Nakamura , Jiro YOKOYA , Hirokuni SAITO
- 申请人： TOKYO OHKA KOGYO CO., LTD.
- 申请人地址： JP Kawasaki-shi
- 专利权人： TOKYO OHKA KOGYO CO., LTD.
- 当前专利权人： TOKYO OHKA KOGYO CO., LTD.
- 当前专利权人地址： JP Kawasaki-shi
- 优先权： JP2019-204241 20191111
- 主分类号： G03F7/039
- IPC分类号： G03F7/039 ; G03F7/20 ; G03F7/32 ; C08F220/28
摘要：
A resist composition which contains a polymer compound having a constitutional unit (a01) represented by General Formula (a01-1), which contains a specific acid dissociable group represented by General Formula (a01-r-1) and a constitutional unit (a02) represented by General Formula (a02-1), which contains a specific cyanolactone structure, a proportion of the constitutional unit (a01) is more than 50% by mole and 70% by mole or less
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