Invention Application
- Patent Title: Method and Apparatus for Forming a Patterned Layer of Carbon, Method of Forming a Patterned Layer of Material
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Application No.: US16969088Application Date: 2019-02-26
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Publication No.: US20210032743A1Publication Date: 2021-02-04
- Inventor: Sonia CASTELLANOS ORTEGA , Jan VERHOEVEN , Joost Wilhelmus Maria FRENKEN , Pavlo ANTONOV , Nicolaas TEN KATE , Olivier Christian Maurice LUGIER
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Priority: EP18159654.5 20180302
- International Application: PCT/EP2019/054680 WO 20190226
- Main IPC: C23C16/04
- IPC: C23C16/04 ; H01L21/02 ; C23C16/26 ; C23C16/48
Abstract:
Methods and apparatus for forming a patterned layer of carbon are disclosed. In one arrangement, a selected portion of a surface of a solid structure is irradiated with extreme ultraviolet radiation in the presence of a carbon-containing precursor. The radiation interacts with the solid structure in the selected portion to cause formation of a layer of carbon in the selected portion from the carbon-containing precursor. The layer of carbon is formed in a pattern defined by the selected portion.
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Information query
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