Invention Application
- Patent Title: PATTERNED VACUUM CHUCK FOR DOUBLE-SIDED PROCESSING
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Application No.: US16993069Application Date: 2020-08-13
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Publication No.: US20200373188A1Publication Date: 2020-11-26
- Inventor: Joseph YUDOVSKY , Visweswaren SIVARAMAKRISHNAN , Ludovic GODET , Rutger MEYER TIMMERMAN THIJSSEN
- Applicant: Applied Materials, Inc.
- Main IPC: H01L21/683
- IPC: H01L21/683 ; H01L21/687

Abstract:
Embodiments described herein relate to a substrate chucking apparatus having a plurality of cavities formed therein. The cavities are formed in a body of the chucking apparatus. In one embodiment, a first plurality of ports are formed in a chucking surface of the body and extend to a bottom surface of the body. In another embodiment, a second plurality of ports are formed in a bottom surface of the plurality of cavities and extend through the body to a bottom surface of the body.
Public/Granted literature
- US11222809B2 Patterned vacuum chuck for double-sided processing Public/Granted day:2022-01-11
Information query
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