- 专利标题: METHOD OF REMOVING CHEMICALS FROM A SUBSTRATE
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申请号: US16881113申请日: 2020-05-22
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公开(公告)号: US20200286727A1公开(公告)日: 2020-09-10
- 发明人: Ji-Hoon JEONG , Jung-Min OH , Kun-Tack LEE , Hyo-San LEE
- 申请人: SAMSUNG ELECTRONICS CO., LTD.
- 优先权: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@383f6b95
- 主分类号: H01L21/02
- IPC分类号: H01L21/02 ; H01L21/67
摘要:
A method of processing substrates, comprising: loading a substrate into a process chamber; supplying a supercritical fluid, that is a process fluid under the supercritical state, into the process chamber, chemicals separated from the substrate and the supercritical fluid being mixed into a supercritical mixture in the process chamber; and gradually decreasing a chemical concentration of the supercritical mixture by alternately repeating a pressure drop mode and a supplemental mode such that the supercritical mixture partially flows out from the process chamber at the pressure drop mode when an inner pressure of the process chamber reaches a first pressure and the supercritical fluid turbulently flows into the process chamber at the supplemental mode when the inner pressure of the process chamber reaches a second pressure that is smaller than the first pressure and over a supercritical pressure of the process fluid.
公开/授权文献
- US11227761B2 Method of removing chemicals from a substrate 公开/授权日:2022-01-18
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