Invention Application
- Patent Title: RESISTIVE MEMORY CROSSBAR ARRAY WITH A MULTILAYER HARDMASK
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Application No.: US16287485Application Date: 2019-02-27
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Publication No.: US20200274067A1Publication Date: 2020-08-27
- Inventor: Hiroyuki Miyazoe , Takashi Ando , Asit Ray , Seyoung Kim
- Applicant: International Business Machines Corporation
- Main IPC: H01L45/00
- IPC: H01L45/00 ; H01L27/24

Abstract:
Devices and/or methods that facilitate forming a resistive memory crossbar array with a multilayer hardmask are provided. In some embodiments, a resistive random access memory (RRAM) can comprise a multilayer hardmask comprising three layers, an interlayer oxide between a first layer of silicon nitride and a second layer of silicon nitride. In other embodiments, an RRAM can comprise a multilayer hardmask comprising two layers, a layer of an oxide on a layer of silicon nitride.
Public/Granted literature
- US10833268B2 Resistive memory crossbar array with a multilayer hardmask Public/Granted day:2020-11-10
Information query
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