Invention Application
- Patent Title: METHODS OF INSPECTING SAMPLES WITH MULTIPLE BEAMS OF CHARGED PARTICLES
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Application No.: US16812109Application Date: 2020-03-06
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Publication No.: US20200271598A1Publication Date: 2020-08-27
- Inventor: Kuo-Feng TSENG , Zhonghua DONG , Yixiang WANG , Zhong-wei CHEN
- Applicant: ASML Netherlands B.V.
- Main IPC: G01N23/203
- IPC: G01N23/203 ; G01N23/2276 ; G01N23/2254 ; G01N23/2252

Abstract:
Disclosed herein is an apparatus comprising: a source configured to emit charged particles, an optical system and a stage; wherein the stage is configured to support a sample thereon and configured to move the sample by a first distance in a first direction; wherein the optical system is configured to form probe spots on the sample with the charged particles; wherein the optical system is configured to move the probe spots by the first distance in the first direction and by a second distance in a second direction, simultaneously, while the stage moves the sample by the first distance in the first direction; wherein the optical system is configured to move the probe spots by the first distance less a width of one of the probe spots in an opposite direction of the first direction, after the stage moves the sample by the first distance in the first direction.
Public/Granted literature
- US11815473B2 Methods of inspecting samples with multiple beams of charged particles Public/Granted day:2023-11-14
Information query